Continuing downscaling of semiconductors devices brings new challenges for plasma etch and strip. New materials (high-k and low-k dielectrics, metal gates, phase-shift memories etc.) and new architectures (3D devices, channel-engineered devices etc.) require new etch and strip approaches. We organize this workshop to bring together people from research institutions and industry to discuss new challenges in plasma etch and strip |
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Leuven has a long and rich history. Founded in the 9th century, it became an important trading centre during the middle ages. A very important event in that time was the foundation of its University in 1425.
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